Overview

Korea Vacuum Tech, Inc. (KVT) is proud to introduce the
latest revolutionary addition to our product line, the
CVD system.
Chemical Vapor Deposition is a chemical reactive
process used to produce high –purity, high performance
solid materials in a vacuum state. In a typical
CVD process, the water(substrate) is exposed to one or
more volatile precursors which react and / or decompose
on the substrate surface to produce a desired
deposit. Thermal Chemical Vapor Deposition(Thermal
CVD) is a unique form of the CVD process used primarily
to deposit thin lms from a gaseous state(Vapor) to
a solid state on some substrate. Thermal CVD is
dependent upon thermal energy to create of maintain
a chemical reaction.

Features

≻ 3 Zone Furnace for temperature up to 1000℃

≻ Sample size : up to 2”

≻ Easy to sample loading & unloading by loading bar

≻ 3” dia. Quartz Tube

≻ Operation pressure ~ 1Torr

≻ No water cooling