Traveling wave type ALD

ㆍTraveling wave type thermal ALD

ㆍLaminar gas flow (Side gas flow)

ㆍVariable gas delivery system : Bubbler, LDS

ㆍLow particle generation

ㆍVery small volume for process

ㆍAvailable laminated & mixed process

ㆍProcess temperature : up to 450°C

ㆍPrecursor canister : 4EA(standard)

ㆍSubstrate size :
   4 ~ 8” wafer
   2G : 370x470mm glass

ㆍApplications
Dielectric thin films : Al2O3, HfO2, ZrO2, TiO2, ZnO2, STO, ZnS, Laminate films, etc.