J&L Tech
J&L Tech
Description
Carbozen - ™ Lab Series can perform high quality coating in lab scale size.
It is able to provide multiple kinds of coating on the product utilizing a glow discharge method.
Specification
| Chamber size | Ø500×H250mm |
| Deposition rate | 300mm per hour |
| Cathode size | Ø300 mm |
| Plasma source | Linear ion source, UBM sputter, Cathodic arc |
주요특징
• 개발예산에 맞춰 다양한 옵션 선택 가능 (선택옵션에 따라 가격 조절이 가능)
• 20년 동안 축적해온 양산 코팅 기술로 최적화된 솔루션 제공
• 코팅공정의 설계, 수정이 용이한 전자동 소프트웨어
Product Models
●=Standard / ●=Option
| Components | Full Option | PECVD | Sputtering | Metal-ARC | Specifications |
| Rotary pump | ● | ● | ● | ● | 4~60 m3/h |
| Turbo pump | ● | ● | ● | ● | 200~400 l/s |
| Throttl Valve | ● | ● | Blade type | ||
| Baratron Gauge | ● | ● | 0.1~1torr | ||
| Pressure Controller | ● | ● | Automatic Control | ||
| Heater | ● | ● | ● | ● | 400~500℃ |
| 1 Fold Turntable | ● | ● | 3 Axis Rotation | ||
| 2 Fold Turntable | ● | ● | ● | ● | 3 Axis Rotation & Revolution |
| Sputter DC Power Supply | ● | ● | 2KW DC | ||
| Ion Source DC Power Supply | ● | ● | ● | 10KW DC | |
| Cathodic Arc Power Supply | ● | ● | 5KW DC | ||
| Bias Power Supply | ● | ● | ● | ● | 5KW 350khz |
| Cathode Power Supply | ● | ● | AC or RF | ||
| 4 Inch Sputter Source | ● | ● | Unbalanced Magnetron Sputter | ||
| 4 Inch Ion Source | ● | ● | ● | ● | Closed drift Type |
| 3 Inch Cathodic Arc Source | ● | ● | Direct cooling Type |
Komachine Inc.
Head Office:
Ace Dongbaek Tower 1-1101, 16-4,
Dongbaekjungang-ro 16beon-gil, Giheung-gu,
Yongin City, Gyeonggido, South Korea 17015
Branch Office:
606, Seoul Stratup Center, 10,
Noryangjin-ro, Dongjak-gu, Seoul, South Korea 06938
CEOCharlie Park
Corporate #535-86-00664
ⓒ2024 Komachine Inc. All rights reserved.