Carbozen - ™ Lab Series can perform high quality coating in lab scale size.
It is able to provide multiple kinds of coating on the product utilizing a glow discharge method.
Specification
| Chamber size |
Ø500×H250mm |
| Deposition rate |
300mm per hour |
| Cathode size |
Ø300 mm |
| Plasma source |
Linear ion source, UBM sputter, Cathodic arc |
주요특징
• 개발예산에 맞춰 다양한 옵션 선택 가능 (선택옵션에 따라 가격 조절이 가능)
• 20년 동안 축적해온 양산 코팅 기술로 최적화된 솔루션 제공
• 코팅공정의 설계, 수정이 용이한 전자동 소프트웨어
Product Models
●=Standard / ●=Option
| Components |
Full Option |
PECVD |
Sputtering |
Metal-ARC |
Specifications |
| Rotary pump |
● |
● |
● |
● |
4~60 m3/h |
| Turbo pump |
● |
● |
● |
● |
200~400 l/s |
| Throttl Valve |
● |
● |
|
|
Blade type |
| Baratron Gauge |
● |
● |
|
|
0.1~1torr |
| Pressure Controller |
● |
● |
|
|
Automatic Control |
| Heater |
● |
● |
● |
● |
400~500℃ |
| 1 Fold Turntable |
● |
● |
|
|
3 Axis Rotation |
| 2 Fold Turntable |
● |
● |
● |
● |
3 Axis Rotation & Revolution |
| Sputter DC Power Supply |
● |
|
● |
|
2KW DC |
| Ion Source DC Power Supply |
● |
● |
● |
|
10KW DC |
| Cathodic Arc Power Supply |
● |
|
|
● |
5KW DC |
| Bias Power Supply |
● |
● |
● |
● |
5KW 350khz |
| Cathode Power Supply |
● |
● |
|
|
AC or RF |
| 4 Inch Sputter Source |
● |
|
● |
|
Unbalanced Magnetron Sputter |
| 4 Inch Ion Source |
● |
● |
● |
● |
Closed drift Type |
| 3 Inch Cathodic Arc Source |
● |
|
|
● |
Direct cooling Type |
