The Falcon™ : Multi-Stack wafer architecture with independent gas distribution and wafer rotation offers a higher productivity alternative to today’s much lower throughput solutions, with minimal to no pattern size effects.

Key Features

- Multi-stack Wafer Process

- Independently Controlled Gas Distribution Nozzle for Each Wafer 

- Wafer Rotation

- In-situ Chamber Cleaning

- Dry Pre-clean Chamber

Benefits

- High Throughput

- Excellent Within Wafer Uniformity - Thickness & Dopant Concentration

- Excellent Wafer to Wafer Uniformity - Thickness & Dopant Concentration

- Minimal Loading Effect

- Lower Particle Generation with In-situ Cleaning 

Applications