The Albatross™ : Our high density and low electron temperature plasma offers many advantages for plasma surface treatment processes. Our patented, dual rotated ICP plasma antenna technology, surrounding a quartz chamber, provides excellent film uniformity, very clean treatment and wide process range to meet every customer’s needs.

Key Features

- Dual Rotated Spiral ICP Antenna Plasma Source

- Quartz Chamber for Metal Contamination Free Process

- High Temperature Process up to 600°C

- High Vacuum Configuration w/Turbo Molecular & Dry Pumps   

Benefits

- Damage Free Plasma 

- Lower Particle Generation

- Wide Process Window

- Thick Plasma Oxidation

Applications