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EUGENE TECH

EUGENE TECH

Multi-Stack SEG(Selective Epitaxial Growth) System

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Origin

Korea (Republic of)


Description

The Falcon™ : Multi-Stack wafer architecture with independent gas distribution and wafer rotation offers a higher productivity alternative to today’s much lower throughput solutions, with minimal to no pattern size effects.

 

Key Features

- Multi-stack Wafer Process

- Independently Controlled Gas Distribution Nozzle for Each Wafer 

- Wafer Rotation

- In-situ Chamber Cleaning

- Dry Pre-clean Chamber


Benefits

- High Throughput

- Excellent Within Wafer Uniformity - Thickness & Dopant Concentration

- Excellent Wafer to Wafer Uniformity - Thickness & Dopant Concentration

- Minimal Loading Effect

- Lower Particle Generation with In-situ Cleaning 


Applications

EUGENE TECH Multi-Stack SEG(Selective Epitaxial Growth) System Falcon™

Inquiry

KOMACHINE CO., LTD.
CEO  Charlie ParkCorporate #  535-86-00664
(Post 17015) 1101ho ,16-4, Dongbaekjungang-ro 16beon-gil, Giheung-gu, Yongin-si, Gyeonggi-do, Republic of Korea

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