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Atomic-Basic
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CN1

Semi conductor and Hi tech equipment manufacturer, ALD, Coating solution

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Manufacturer
CN1
Product Type
Machine
Brand
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SKU
52983
Product Name
Atomic-Basic
Model Name
-
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Product Details

Compact reactor Thermal ALD

ㆍCompact ALD Model

ㆍThermal ALD

ㆍWafer Size : ≤ 6″ Wafer

ㆍProcess temperature : up to 250°C

ㆍApplications : Oxide Film(Al2O3), etc

ㆍVery small Volume for process

CN1 Atomic-Basic

CN1
Semi conductor and Hi tech equipment manufacturer, ALD, Coating solution
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