Atomic Layer Deposition(ALD)
is a powerful thin film deposition innovator based on the sequential reaction of gas precursors at a surface.

ㆍPrecise atomic level thickness and composition control

ㆍExcellent conformality for deep trench with high aspect ratio and complex 3D nano- & micro-structures

ㆍExcellent thickness uniformity in large area substrates

ㆍLower process temperature than CVD

ㆍAvailable Materials : Metal, Metal oxide, Metal nitride, Metal sulfide, Laminate, mixed materials

ㆍApplication fields : Semiconductor, Display, Solar cell, LED, MEMS, Optical-, Bio-, Nano- and Flexible devices