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Excimer laser annealing system
모델명
LPA-EXA100
시리즈
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레이저앤피직스(주)

레이저 모듈제조업체, Eximer Laser, Semi Conductor, Display, PCB, EMC

연락처
031-322-1537
이메일
laser@laser-physics.co.kr
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SKU
126988
제품명
Excimer laser annealing system
모델명
LPA-EXA100
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중량
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제품 상세 정보

Products Detail

Excimer laser annealing system



Products Introduction

Model   LPA-EXA100
Laser type    XeCl
Wave Length    308 mm
Pulse repetion rate   < 30 Hz
Average energy   < 500mJ
Power stability   5 %
Warming up   30 min.
Gas lifetime   20 x 10e6 pulses
Beam dimension  10 x 20 ㎟
Beam divergence   3 x 10 mrad
Laser tube lifetime   1 I 109 pulses
Cooling    Water

- Amorphous silicon annealing system by excimer laser

- Amorphous silicon is changed to polycrystalline sillicon after melting in a moment during being irradiated by XeCl excimer laser.

- TFT LCD annealing process


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레이저앤피직스(주)
레이저앤피직스(주)
레이저 모듈제조업체, Eximer Laser, Semi Conductor, Display, PCB, EMC
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