



Laser Module manufacturer, Eximer Laser, Semi Conductor, Display, PCB, EMC
Products Detail
Excimer laser annealing system
Products Introduction
| Model | LPA-EXA100 |
| Laser type | XeCl |
| Wave Length | 308 mm |
| Pulse repetion rate | < 30 Hz |
| Average energy | < 500mJ |
| Power stability | 5 % |
| Warming up | 30 min. |
| Gas lifetime | 20 x 10e6 pulses |
| Beam dimension | 10 x 20 ㎟ |
| Beam divergence | 3 x 10 mrad |
| Laser tube lifetime | 1 I 109 pulses |
| Cooling | Water |
- Amorphous silicon annealing system by excimer laser
- Amorphous silicon is changed to polycrystalline sillicon after melting in a moment during being irradiated by XeCl excimer laser.
- TFT LCD annealing process















