Korea Vacuum Tech, Ltd. (KVT) is proud to introduce the latest revolutionary addition to
our product line, the ALD system.
ALD has the such advantages over other conventional deposition methods as excellent
uniform thickness, low processing temperature, and precise film thickness control.
ICP plasma enhanced atomic layer deposition has many advantages, such
as the wide process window, high film density, low impurity contents, and broad choice
of precursor chemistry and/or reactants compared to the conventional ALD and metal
organic atomic layer deposition (MOALD)Methods. KVA-4000 series is designed and
developed to unique hot wall, top flow, dual-chamber and also, KVAC-4000,
KVA-ICP4000 series, KVA-CCP4000 series has the deposition of highest quality film with excellent uniformity.
The KVAC-4000L system is a hybrid system that can process ALD process and CVD
process in one chamber. The ICP type ALD process and thermal CVD process
are sufficient to produce good quality films.
Specifications (ICP type)
Process & Loadlock Chamber
Piece to 6 inches
Temperature range: up to 752°F (400°F)
Temperature Uniformity: ±41°F (±5°C)
Base Pressure &
Less than 1.0E-3 Torr: Rotary or Dry pump
Less than 1.0E-6 Torr: Turbo Molecular Pump (Option)
Process < 10 Torr: Rotary or Dry pump
ICP or CCP Type: RF Power: 300W
Up to 2, Temperature: 250°C (Jacket)
Mass flow controller
Precusor: Ar(Bubbling) / Purge: Ar or N2
Reactant(Plasma): O2, NH3, H2, etc..
Auto Pressure Controller
Throttle valve & Baratron Sensor