Chat with us, powered by LiveChat PECVD Series | Korea Vacuum Tech - Komachine
Product Name
Model PECVD Series
Series CVD
Catalog
Product Description

Korea Vacuum Tech  PECVD Series

Overview

Korea Vacuum Tech, Ltd. (KVT) is proud to introduce the latest revolutionary addition

to our product line, the CVD system. Chemical Vapor Deposition is a chemical reactive

process used to produce high-purity, high-performance solid materials in a vacuum state.

In a typical CVD process, the wafer (substrate) is exposed to one or more volatile precursors

which react and / or decompose on the substrate surface to produce a desired deposit.

Plasma Enhanced Chemical Vapor Deposition (PECVD) is a unique form of the CVD

process used primarily to deposit thin films from a gaseous state (vapor) to a solid state

on some substrate. PECVD is not dependent upon thermal energy alone to create of

maintain a chemical reaction but rather it uses RF-enhanced glow discharge to convey

energy to a reactive gas which subsequently, in a vacuum environment, sets the

conditions necessary for effective thin film deposition.

 

Features

≻ Compared to other CVD application, PECVD allows for operations in a high-vacuum, low-temp environment

≻ Specially designed gas shower head provides uniform gas flow – consistent film thickness over a surface

≻ Can distribute multiple gases, independently about the substrate and mixed outside of gas shower head

≻ Semi – or Fully- Automate processing available

≻ Capable of multi-layer, co-deposition processing

≻ High deposition rates-fast!

Specifications

ITEM

SPECIFICATIONS

Process Chamber

Material : SUS304 / Anodized Al6061

Loadlock Chamber

N/A

Vacuum Pumping

Station

TMP & Dry Pump

Gas shower Head

Shower Head with insulator/RF bias electrode isolation

Pressure Control

Auto Throttle Valve & CDG Sensor

Substrate Heating

Type

- Heating element size: 4” ~ 6”

- Heating element type: SiC, Molded

Gas Supply Unit

Mass Flow Controller & valve

Plasma Source

RF generator with matching network

Process control

KVC-P4000

KVC-P4000L

KVC-P2000

KVC-P2000L

PC Control

By Labview

PC Control

By Labview

Semi-Auto

Semi-Auto

Korea Vacuum Tech  PECVD Series 1

Korea Vacuum Tech  PECVD Series 2

Overview

Korea Vacuum Tech, Ltd. (KVT) is proud to introduce the latest revolutionary addition

to our product line, the CVD system. Chemical Vapor Deposition is a chemical reactive

process used to produce high-purity, high-performance solid materials in a vacuum state.

In a typical CVD process, the wafer (substrate) is exposed to one or more volatile precursors

which react and / or decompose on the substrate surface to produce a desired deposit.

Plasma Enhanced Chemical Vapor Deposition (PECVD) is a unique form of the CVD

process used primarily to deposit thin films from a gaseous state (vapor) to a solid state

on some substrate. PECVD is not dependent upon thermal energy alone to create of

maintain a chemical reaction but rather it uses RF-enhanced glow discharge to convey

energy to a reactive gas which subsequently, in a vacuum environment, sets the

conditions necessary for effective thin film deposition.

 

Features

≻ Compared to other CVD application, PECVD allows for operations in a high-vacuum, low-temp environment

≻ Specially designed gas shower head provides uniform gas flow – consistent film thickness over a surface

≻ Can distribute multiple gases, independently about the substrate and mixed outside of gas shower head

≻ Semi – or Fully- Automate processing available

≻ Capable of multi-layer, co-deposition processing

≻ High deposition rates-fast!

Specifications

ITEM

SPECIFICATIONS

Process Chamber

Material : SUS304 / Anodized Al6061

Loadlock Chamber

KVC-X000L Series available

Vacuum Pumping

Station

TMP & Dry Pump

Gas shower Head

Shower Head with insulator/RF bias electrode isolation

Pressure Control

Auto Throttle Valve & CDG Sensor

Substrate Heating

Type

- Heating element size: 4” ~ 6”

- Heating element type: SiC, Molded

Gas Supply Unit

Mass Flow Controller & valve

Plasma Source

RF generator with matching network

Process control

KVC-P4000

KVC-P4000L

KVC-P2000

KVC-P2000L

PC Control

By Labview

PC Control

By Labview

Semi-Auto

Semi-Auto

Korea Vacuum Tech  PECVD Series 3

Products of Korea Vacuum Tech