Selcos
Vacuum parts and Alloy Target for Sputtering
Model
Series
Alloy Target for Sputtering and Vacuum Components
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Origin
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Description
▷ Self Made of Alloy Target for efficient and reliable Cathode Sputtering, Organic / inorganic deposition source and supplies related components.
Sputtering Cathode
- Type : Planar, Round, Hexagon, Cylindrical type magnetron gun
- Size : up to 2,000mm
- Target Material : Metal, Oxide, TCO.
Sputtering Target
- Target Material : Metal (Silver, Gold, Titan Color용)
Evaporation Source
- Type : Point cell, Linear cell
- Volume : Host and Dopant (from 3cc ~ )
- Material : Organic and Inorganic material