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Vacuum parts and Alloy Target for Sputtering

Model

Series

Alloy Target for Sputtering and Vacuum Components


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Description

▷ Self Made of Alloy Target for efficient and reliable Cathode Sputtering, Organic / inorganic deposition source and supplies related components.

Sputtering Cathode

- Type : Planar, Round, Hexagon, Cylindrical type magnetron gun
- Size : up to 2,000mm
- Target Material : Metal, Oxide, TCO.

Sputtering Target

- Target Material : Metal (Silver, Gold, Titan Color용)

Evaporation Source

- Type : Point cell, Linear cell
- Volume : Host and Dopant (from 3cc ~ )
- Material : Organic and Inorganic material

Inquiry

Komachine Inc.
Head Office:
Ace Dongbaek Tower 1-1101, 16-4,
Dongbaekjungang-ro 16beon-gil, Giheung-gu,
Yongin City, Gyeonggido, South Korea 17015
Branch Office:
606, Seoul Stratup Center, 10,
Noryangjin-ro, Dongjak-gu, Seoul, South Korea 06938
CEOCharlie Park
Corporate #535-86-00664

ⓒ2024 Komachine Inc. All rights reserved.