Chat with us, powered by LiveChat Vacuum parts and Alloy Target for Sputtering | Selcos - Komachine
Product Name Vacuum parts and Alloy Target for Sputtering
Series Alloy Target for Sputtering and Vacuum Components
Product Description

▷ Self Made of Alloy Target for efficient and reliable Cathode Sputtering, Organic / inorganic deposition source and supplies related components.

Sputtering Cathode

- Type : Planar, Round, Hexagon, Cylindrical type magnetron gun
- Size : up to 2,000mm
- Target Material : Metal, Oxide, TCO.

Sputtering Target

- Target Material : Metal (Silver, Gold, Titan Color용)

Evaporation Source

- Type : Point cell, Linear cell
- Volume : Host and Dopant (from 3cc ~ )
- Material : Organic and Inorganic material

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