TOKYO OHKA KOGYO is a fine chemical company established in 1940, primarily focusing on photoresists, high-purity chemicals, and inorganic and organic chemicals. The company provides essential materials and equipment for semiconductor and display manufacturing processes, contributing to industrial advancement through its advanced microfabrication and high-purity technologies. It maintains a leading position with top global market shares in the semiconductor photoresist sector. The company actively invests in research and development for future technologies, including AI semiconductors and next-generation power semiconductors.TOKYOOHKAKOGYOisafinechemicalcompanyestablishedin1940,primarilyfocusingonphotoresists,high-puritychemicals,andinorganicandorganicchemicals.Thecompanyprovidesessentialmaterialsandequipmentforsemiconductoranddisplaymanufacturingprocesses,contributingtoindustrialadvancementthroughitsadvancedmicrofabricationandhigh-puritytechnologies.Itmaintainsaleadingpositionwithtopglobalmarketsharesinthesemiconductorphotoresistsector.Thecompanyactivelyinvestsinresearchanddevelopmentforfuturetechnologies,includingAIsemiconductorsandnext-generationpowersemiconductors.
Key Products/TechnologiesKeyProducts/Technologies
Photoresists for Semiconductor Manufacturing: A diverse product lineup compatible with various exposure technologies and processes, including g/i-Line, KrF, ArF (dry and immersion), EUV, EB, Lift-Off, Wet Etching, Deep Dry Etching, Bump Formation, and Redistribution Layer (RDL) resists. The company holds the world's top market share in g/i-Line and KrF photoresists and a leading position in EUV and ArF fields. Strategic investment and joint development are underway for the Multi-Trigger Resist (MTR™) platform for next-generation EUV lithography.PhotoresistsforSemiconductorManufacturing:Adiverseproductlineupcompatiblewithvariousexposuretechnologiesandprocesses,includingg/i-Line,KrF,ArF(dryandimmersion),EUV,EB,Lift-Off,WetEtching,DeepDryEtching,BumpFormation,andRedistributionLayer(RDL)resists.Thecompanyholdstheworld'stopmarketshareing/i-LineandKrFphotoresistsandaleadingpositioninEUVandArFfields.StrategicinvestmentandjointdevelopmentareunderwayfortheMulti-TriggerResist(MTR™)platformfornext-generationEUVlithography.
High Purity Chemicals: Supply of high-purity materials essential for semiconductor and display manufacturing, such as cleaning solutions, thinners, developers, stripping solutions, adhesion enhancing materials, and various inorganic and organic chemicals. The company possesses world-class purification technology capable of managing impurities down to ppq (parts per quadrillion) levels.HighPurityChemicals:Supplyofhigh-puritymaterialsessentialforsemiconductoranddisplaymanufacturing,suchascleaningsolutions,thinners,developers,strippingsolutions,adhesionenhancingmaterials,andvariousinorganicandorganicchemicals.Thecompanypossessesworld-classpurificationtechnologycapableofmanagingimpuritiesdowntoppq(partsperquadrillion)levels.
Manufacturing Equipment: Provision of highly functional spin coaters, automatic developing machines for single wafer processing, vacuum UV hardening machines with superior heat resistance and etching properties, and integrated processing machines for wafer bonding and debonding.ManufacturingEquipment:Provisionofhighlyfunctionalspincoaters,automaticdevelopingmachinesforsinglewaferprocessing,vacuumUVhardeningmachineswithsuperiorheatresistanceandetchingproperties,andintegratedprocessingmachinesforwaferbondinganddebonding.
Functional Materials: Development and supply of various functional materials used in semiconductor packaging and MEMS manufacturing processes, including surface modifiers, structure forming materials, protective coating materials, and adhesives.FunctionalMaterials:DevelopmentandsupplyofvariousfunctionalmaterialsusedinsemiconductorpackagingandMEMSmanufacturingprocesses,includingsurfacemodifiers,structureformingmaterials,protectivecoatingmaterials,andadhesives.
Core AdvantagesCoreAdvantages
World-Leading Market Share: A dominant position in the semiconductor photoresist market, holding the global top share in g/i-Line and KrF photoresists, and a strong second position globally in EUV photoresists.World-LeadingMarketShare:Adominantpositioninthesemiconductorphotoresistmarket,holdingtheglobaltopshareing/i-LineandKrFphotoresists,andastrongsecondpositiongloballyinEUVphotoresists.
Advanced Microfabrication and High Purity Technologies: Possession of world-class microfabrication technology for nanometer-scale circuit patterning and high-purity refining technology capable of detecting and removing impurities at ppq levels.AdvancedMicrofabricationandHighPurityTechnologies:Possessionofworld-classmicrofabricationtechnologyfornanometer-scalecircuitpatterningandhigh-purityrefiningtechnologycapableofdetectingandremovingimpuritiesatppqlevels.
Customer-Oriented Strategy and Foundry Integration: Deployment of 'Sales Engineers' directly to major client fabrication facilities, achieving a three-pronged integration of development, manufacturing, and sales. This deep co-development with top-tier foundries like TSMC ensures proprietary chemical formulations are embedded into early-stage validation for 2nm and sub-2nm nodes, creating a significant strategic moat.Customer-OrientedStrategyandFoundryIntegration:Deploymentof'SalesEngineers'directlytomajorclientfabricationfacilities,achievingathree-prongedintegrationofdevelopment,manufacturing,andsales.Thisdeepco-developmentwithtop-tierfoundrieslikeTSMCensuresproprietarychemicalformulationsareembeddedintoearly-stagevalidationfor2nmandsub-2nmnodes,creatingasignificantstrategicmoat.
Comprehensive Product Portfolio: Offering a full lineup of photoresists compatible with all exposure machines, from g/i-Line to cutting-edge EUV, along with related chemicals and equipment.ComprehensiveProductPortfolio:Offeringafulllineupofphotoresistscompatiblewithallexposuremachines,fromg/i-Linetocutting-edgeEUV,alongwithrelatedchemicalsandequipment.
Robust Global Supply Chain and Local-for-Local Strategy: Establishment of production bases in four regions worldwide, including Japan, South Korea, Taiwan, and the United States, to mitigate geopolitical risks and ensure stable supply in response to market fluctuations.RobustGlobalSupplyChainandLocal-for-LocalStrategy:Establishmentofproductionbasesinfourregionsworldwide,includingJapan,SouthKorea,Taiwan,andtheUnitedStates,tomitigategeopoliticalrisksandensurestablesupplyinresponsetomarketfluctuations.
Continuous R&D and Future Technology Leadership: A history of continuous research and development since 1940, pioneering Japan's first semiconductor photoresist. Active development of next-generation, high-value-added materials such as PFAS-free products and high heat-resistant materials for SiC/GaN/Ga2O3 power semiconductors.ContinuousR&DandFutureTechnologyLeadership:Ahistoryofcontinuousresearchanddevelopmentsince1940,pioneeringJapan'sfirstsemiconductorphotoresist.Activedevelopmentofnext-generation,high-value-addedmaterialssuchasPFAS-freeproductsandhighheat-resistantmaterialsforSiC/GaN/Ga2O3powersemiconductors.
Target IndustriesTargetIndustries
Semiconductor Manufacturing: Supply of key materials and equipment across front-end processes and semiconductor packaging.SemiconductorManufacturing:Supplyofkeymaterialsandequipmentacrossfront-endprocessesandsemiconductorpackaging.
Flat Panel Display Manufacturing: Provision of photoresists and chemicals necessary for display manufacturing, including LCDs.FlatPanelDisplayManufacturing:Provisionofphotoresistsandchemicalsnecessaryfordisplaymanufacturing,includingLCDs.
Image Sensor and MEMS Manufacturing: Supply of materials for image sensors and MEMS devices, contributing to miniaturization and enhanced functionality in products like smartphones and digital cameras.ImageSensorandMEMSManufacturing:SupplyofmaterialsforimagesensorsandMEMSdevices,contributingtominiaturizationandenhancedfunctionalityinproductslikesmartphonesanddigitalcameras.
Power Semiconductor Sector: Development of high heat-resistant materials and i-Line thick-film photoresists for next-generation power semiconductors such as SiC, GaN, and Ga2O3.PowerSemiconductorSector:Developmentofhighheat-resistantmaterialsandi-Linethick-filmphotoresistsfornext-generationpowersemiconductorssuchasSiC,GaN,andGa2O3.
New Business Fields: Expansion of technological applications into diverse advanced industries, including Bio/Life Science, Optical Applications, and Separation Membranes.NewBusinessFields:Expansionoftechnologicalapplicationsintodiverseadvancedindustries,includingBio/LifeScience,OpticalApplications,andSeparationMembranes.
Fine Chemical Industry: Contribution to a wide range of industrial fields, including chemistry, electronics, cosmetics, pharmaceuticals, reagents, and the high-grade glass industry, through its high-purity chemicals.FineChemicalIndustry:Contributiontoawiderangeofindustrialfields,includingchemistry,electronics,cosmetics,pharmaceuticals,reagents,andthehigh-gradeglassindustry,throughitshigh-puritychemicals.
Major MarketsMajorMarkets
Japan, South Korea, Taiwan, China, SingaporeJapan,SouthKorea,Taiwan,China,Singapore
Europe (including Germany)Europe(includingGermany)
United StatesUnitedStates
Certifications/PatentsCertifications/Patents
Quality Management System Certifications: Acquisition of ISO9001 certification, the international standard for quality management systems, across all manufacturing plants.QualityManagementSystemCertifications:AcquisitionofISO9001certification,theinternationalstandardforqualitymanagementsystems,acrossallmanufacturingplants.
Patented Technologies: Holding numerous patents, including those for resist compositions and resist pattern forming methods (US Patent No. 12566376), aqueous cleaning liquids and electronic device cleaning methods (US Patent No. 12480077), substrate surface treatment methods (US Patent No. 12575346), and cleaning liquids for metal resists (US Patent No. 12428611).PatentedTechnologies:Holdingnumerouspatents,includingthoseforresistcompositionsandresistpatternformingmethods(USPatentNo.12566376),aqueouscleaningliquidsandelectronicdevicecleaningmethods(USPatentNo.12480077),substratesurfacetreatmentmethods(USPatentNo.12575346),andcleaningliquidsformetalresists(USPatentNo.12428611).
World-Class Manufacturing Capability and Quality Control: Maintenance of world-class manufacturing capabilities for high-volume production through ISO-certified quality control processes.World-ClassManufacturingCapabilityandQualityControl:Maintenanceofworld-classmanufacturingcapabilitiesforhigh-volumeproductionthroughISO-certifiedqualitycontrolprocesses.
Introduction
Location
150 Nakamaruko, Nakahara Ward, Kawasaki, Kanagawa 211-0012, Japan
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Information
150 Nakamaruko, Nakahara Ward, Kawasaki, Kanagawa 211-0012, Japan