SUSS is a leading supplier of equipment and process solutions for micro-structuring applications, boasting over 75 years of engineering experience. Its comprehensive portfolio encompasses back-end lithography, wafer bonding, and photomask processing solutions. The company's equipment solutions find application in a wide array of manufacturing processes for daily and industrial use, including memory chips, mobile phone cameras, and tire pressure sensors.SUSSisaleadingsupplierofequipmentandprocesssolutionsformicro-structuringapplications,boastingover75yearsofengineeringexperience.Itscomprehensiveportfolioencompassesback-endlithography,waferbonding,andphotomaskprocessingsolutions.Thecompany'sequipmentsolutionsfindapplicationinawidearrayofmanufacturingprocessesfordailyandindustrialuse,includingmemorychips,mobilephonecameras,andtirepressuresensors.
Key Products/TechnologiesKeyProducts/Technologies
Imaging Solutions: UV scanning mask alignment equipment and UV projection scanners. The SUSS MA/BA Gen4 Pro series offers patterning resolution below 0.5 µm and alignment accuracy of 0.25 µm, providing full-field lithography solutions for MEMS, advanced packaging, 3D integration, and compound semiconductor markets. The MA8 Gen5 is a mask aligner for various imprint applications in LED, MEMS/NEMS, micro-optics, augmented reality, and optoelectronic sensors.ImagingSolutions:UVscanningmaskalignmentequipmentandUVprojectionscanners.TheSUSSMA/BAGen4Proseriesofferspatterningresolutionbelow0.5µmandalignmentaccuracyof0.25µm,providingfull-fieldlithographysolutionsforMEMS,advancedpackaging,3Dintegration,andcompoundsemiconductormarkets.TheMA8Gen5isamaskalignerforvariousimprintapplicationsinLED,MEMS/NEMS,micro-optics,augmentedreality,andoptoelectronicsensors.
Bonding Solutions: Permanent and temporary bonding equipment. The SB8 Gen2 wafer bonder is a semi-automated universal wafer bonding system capable of handling wafers up to 200mm, featuring precise temperature control from 30°C to 500°C and uniform bond forces from 300N to 20kN. This platform is ideal for a wide variety of bonding technologies, including anodic bonding, fusion bonding, eutectic bonding, adhesive bonding, and diffusion bonding.BondingSolutions:Permanentandtemporarybondingequipment.TheSB8Gen2waferbonderisasemi-automateduniversalwaferbondingsystemcapableofhandlingwafersupto200mm,featuringprecisetemperaturecontrolfrom30°Cto500°Canduniformbondforcesfrom300Nto20kN.Thisplatformisidealforawidevarietyofbondingtechnologies,includinganodicbonding,fusionbonding,eutecticbonding,adhesivebonding,anddiffusionbonding.
Coating Solutions: Inkjet printing, coating, and developing equipment. SUSS spin coaters, developers, and spray coaters are renowned for their consistency, available in bench-top, free-standing, and automated configurations. The ACS300 Gen2 is a modular cluster system designed to meet manufacturers' needs for clean, reliable, high-throughput, and modular photolithography processing for 200mm and 300mm wafers.CoatingSolutions:Inkjetprinting,coating,anddevelopingequipment.SUSSspincoaters,developers,andspraycoatersarerenownedfortheirconsistency,availableinbench-top,free-standing,andautomatedconfigurations.TheACS300Gen2isamodularclustersystemdesignedtomeetmanufacturers'needsforclean,reliable,high-throughput,andmodularphotolithographyprocessingfor200mmand300mmwafers.
Photomask Solutions: Cleaning, baking, and developing equipment. The HMx Square is designed for high-quality substrate processing for photomask applications, optoelectronics, OLED, and special semiconductor back-end (MEMS) applications, offering develop, etch, and cleaning functionalities. The MaskTrack X GlueBuster is a pellicle glue removal system supporting the maintenance of 193i lithography photomasks.PhotomaskSolutions:Cleaning,baking,anddevelopingequipment.TheHMxSquareisdesignedforhigh-qualitysubstrateprocessingforphotomaskapplications,optoelectronics,OLED,andspecialsemiconductorback-end(MEMS)applications,offeringdevelop,etch,andcleaningfunctionalities.TheMaskTrackXGlueBusterisapellicleglueremovalsystemsupportingthemaintenanceof193ilithographyphotomasks.
Core AdvantagesCoreAdvantages
Extensive Engineering Experience and Technology Leadership: As the manufacturer of the world's first mask aligner, the company is a recognized technology leader in back-end lithography, wafer bonding, and photomask processing.ExtensiveEngineeringExperienceandTechnologyLeadership:Asthemanufactureroftheworld'sfirstmaskaligner,thecompanyisarecognizedtechnologyleaderinback-endlithography,waferbonding,andphotomaskprocessing.
Comprehensive Solution Portfolio: Provision of solutions covering all performance-relevant steps for wafer processing, including coating, baking, developing, aligning, wafer bonding, and photomask cleaning equipment.ComprehensiveSolutionPortfolio:Provisionofsolutionscoveringallperformance-relevantstepsforwaferprocessing,includingcoating,baking,developing,aligning,waferbonding,andphotomaskcleaningequipment.
Contribution to Next-Generation Technologies: Close cooperation with research institutes and industry partners to advance next-generation technologies such as 3D integration, nanoimprint lithography, and key processes for WLP, MEMS, and LED manufacturing.ContributiontoNext-GenerationTechnologies:Closecooperationwithresearchinstitutesandindustrypartnerstoadvancenext-generationtechnologiessuchas3Dintegration,nanoimprintlithography,andkeyprocessesforWLP,MEMS,andLEDmanufacturing.
Global Infrastructure and Service Support: A global infrastructure for applications and service, supporting over 8,000 installed systems worldwide.GlobalInfrastructureandServiceSupport:Aglobalinfrastructureforapplicationsandservice,supportingover8,000installedsystemsworldwide.
High Precision and Throughput: Offering cost-effective solutions with unsurpassed quality and cutting-edge technology, enabling customers to maximize yield at high throughput and reduce cost of ownership.HighPrecisionandThroughput:Offeringcost-effectivesolutionswithunsurpassedqualityandcutting-edgetechnology,enablingcustomerstomaximizeyieldathighthroughputandreducecostofownership.
Addressing AI and High-Bandwidth Memory (HBM) Demand: Provision of temporary wafer bonding solutions and processes crucial for the production of microchips required for AI applications.AddressingAIandHigh-BandwidthMemory(HBM)Demand:ProvisionoftemporarywaferbondingsolutionsandprocessescrucialfortheproductionofmicrochipsrequiredforAIapplications.
Target IndustriesTargetIndustries
Semiconductor Industry: Manufacturing of memory chips, processors, MEMS, LEDs, and other microsystem components.SemiconductorIndustry:Manufacturingofmemorychips,processors,MEMS,LEDs,andothermicrosystemcomponents.
Advanced Packaging: Flip-chip, WLCSP, FOWLP, and 2.5D/3D packaging technologies.AdvancedPackaging:Flip-chip,WLCSP,FOWLP,and2.5D/3Dpackagingtechnologies.
MEMS (Micro-Electro-Mechanical Systems): Key components in automotive, industrial, medical, aerospace, and consumer applications.MEMS(Micro-Electro-MechanicalSystems):Keycomponentsinautomotive,industrial,medical,aerospace,andconsumerapplications.
LED (Light Emitting Diode): Optoelectronic devices, consumer electronics, automotive, and general lighting applications.LED(LightEmittingDiode):Optoelectronicdevices,consumerelectronics,automotive,andgenerallightingapplications.
Research and Development: University electronics, material science, renewable energy groups, and semiconductor manufacturing and research departments.ResearchandDevelopment:Universityelectronics,materialscience,renewableenergygroups,andsemiconductormanufacturingandresearchdepartments.
Major MarketsMajorMarkets
Taiwan, South Korea, China, Japan, Southeast AsiaTaiwan,SouthKorea,China,Japan,SoutheastAsia
Germany, France, Netherlands, Scandinavia, United Kingdom, IrelandGermany,France,Netherlands,Scandinavia,UnitedKingdom,Ireland
United StatesUnitedStates
Certifications/PatentsCertifications/Patents
ISO 9001 certification for its quality management system.ISO9001certificationforitsqualitymanagementsystem.
Equipment design in accordance with SEMI S1-0701E, S2-0706D, S8-0308, S13-0305, and CE standards.EquipmentdesigninaccordancewithSEMIS1-0701E,S2-0706D,S8-0308,S13-0305,andCEstandards.
Technical strengths: Precision alignment platforms and chuck technologies enabling consistent CD control and sub-micron overlay. Evolution of bonder technology from anodic and thermo-compression to fusion/hybrid bonding for 3D integration and micro-bump/RDL process enablement.Technicalstrengths:PrecisionalignmentplatformsandchucktechnologiesenablingconsistentCDcontrolandsub-micronoverlay.Evolutionofbondertechnologyfromanodicandthermo-compressiontofusion/hybridbondingfor3Dintegrationandmicro-bump/RDLprocessenablement.
Innovation in technology development: Contribution to the advancement of next-generation technologies such as 3D integration and nanoimprint lithography.Innovationintechnologydevelopment:Contributiontotheadvancementofnext-generationtechnologiessuchas3Dintegrationandnanoimprintlithography.
Introduction
Location
Schleißheimer Str. 90, 85748 Garching bei München, Germany
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Information
Schleißheimer Str. 90, 85748 Garching bei München, Germany