S&S TECH, established in 2001, is a specialized company in blank masks, a core raw material for semiconductor and display manufacturing processes. The company successfully localized blank mask production for the first time in Korea, playing a crucial role in enhancing technological self-reliance. S&S TECH leads the domestic production of Extreme Ultraviolet (EUV) blank masks and pellicles, contributing to technological innovation in next-generation semiconductor processes. The company focuses on developing high-value-added products through aggressive R&D investments and patent applications and registrations. It secures explosive growth momentum through stable existing businesses and new EUV-related ventures.S&STECH,establishedin2001,isaspecializedcompanyinblankmasks,acorerawmaterialforsemiconductoranddisplaymanufacturingprocesses.ThecompanysuccessfullylocalizedblankmaskproductionforthefirsttimeinKorea,playingacrucialroleinenhancingtechnologicalself-reliance.S&STECHleadsthedomesticproductionofExtremeUltraviolet(EUV)blankmasksandpellicles,contributingtotechnologicalinnovationinnext-generationsemiconductorprocesses.Thecompanyfocusesondevelopinghigh-value-addedproductsthroughaggressiveR&Dinvestmentsandpatentapplicationsandregistrations.ItsecuresexplosivegrowthmomentumthroughstableexistingbusinessesandnewEUV-relatedventures.
Key Products/TechnologiesKeyProducts/Technologies
Semiconductor blank masks are raw materials for photomasks used in realizing patterns of hundreds to tens of nanometers for highly integrated circuits like DRAM. The company offers a diverse product lineup, including Binary (BIN) blank masks, KrF and ArF Phase Shift Masks (PSM), and hard mask blank masks. Key capabilities include controlling substrate, metal film, and resist film properties for improved resolution. Extreme Ultraviolet (EUV) blank masks are advanced products manufactured by stacking absorber-based alloys on thin multi-layers at nanometer scales. S&S TECH is actively researching and developing four types of EUV blank masks, including BIN, Hard Mask (HM) BIN, HM PSM, and Thin BIN types.SemiconductorblankmasksarerawmaterialsforphotomasksusedinrealizingpatternsofhundredstotensofnanometersforhighlyintegratedcircuitslikeDRAM.Thecompanyoffersadiverseproductlineup,includingBinary(BIN)blankmasks,KrFandArFPhaseShiftMasks(PSM),andhardmaskblankmasks.Keycapabilitiesincludecontrollingsubstrate,metalfilm,andresistfilmpropertiesforimprovedresolution.ExtremeUltraviolet(EUV)blankmasksareadvancedproductsmanufacturedbystackingabsorber-basedalloysonthinmulti-layersatnanometerscales.S&STECHisactivelyresearchinganddevelopingfourtypesofEUVblankmasks,includingBIN,HardMask(HM)BIN,HMPSM,andThinBINtypes.
FPD (Flat Panel Display) blank masks are raw materials for photomasks used in manufacturing liquid crystal devices for large displays such as TFT-LCDs and OLEDs. These masks come in various sizes depending on the final product and are also referred to as large-area blank masks. The company focuses on developing next-generation display products, including TM and PSM blank masks, and 10th-generation large-area blank masks. EUV pellicles are critical components for protecting photomasks, with 400W EUV pellicles demonstrating a transmittance of 91.2% and capable of producing 25,000 wafers. Efforts are underway to secure technological superiority through the development of next-generation pellicles capable of withstanding over 800W.FPD(FlatPanelDisplay)blankmasksarerawmaterialsforphotomasksusedinmanufacturingliquidcrystaldevicesforlargedisplayssuchasTFT-LCDsandOLEDs.Thesemaskscomeinvarioussizesdependingonthefinalproductandarealsoreferredtoaslarge-areablankmasks.Thecompanyfocusesondevelopingnext-generationdisplayproducts,includingTMandPSMblankmasks,and10th-generationlarge-areablankmasks.EUVpelliclesarecriticalcomponentsforprotectingphotomasks,with400WEUVpelliclesdemonstratingatransmittanceof91.2%andcapableofproducing25,000wafers.Effortsareunderwaytosecuretechnologicalsuperioritythroughthedevelopmentofnext-generationpelliclescapableofwithstandingover800W.
Core AdvantagesCoreAdvantages
As the sole domestic specialized blank mask manufacturer, the company successfully entered and established a strong market position within the Korean semiconductor and display industries.Asthesoledomesticspecializedblankmaskmanufacturer,thecompanysuccessfullyenteredandestablishedastrongmarketpositionwithintheKoreansemiconductoranddisplayindustries.
Leading the localization of Extreme Ultraviolet (EUV) blank masks and pellicles, significantly enhancing technological self-reliance in a market previously dominated by Japanese companies.LeadingthelocalizationofExtremeUltraviolet(EUV)blankmasksandpellicles,significantlyenhancingtechnologicalself-relianceinamarketpreviouslydominatedbyJapanesecompanies.
A history of winning a patent infringement lawsuit against a Japanese competitor (Hoya) for high-end phase-shift blank masks, demonstrating aggressive R&D investment and proactive technology development capabilities. The company's strategy focuses on high-value-added technologies, such as phase-shift masks (PSM), essential for 3-nanometer and below processes.AhistoryofwinningapatentinfringementlawsuitagainstaJapanesecompetitor(Hoya)forhigh-endphase-shiftblankmasks,demonstratingaggressiveR&Dinvestmentandproactivetechnologydevelopmentcapabilities.Thecompany'sstrategyfocusesonhigh-value-addedtechnologies,suchasphase-shiftmasks(PSM),essentialfor3-nanometerandbelowprocesses.
Close strategic cooperation, joint development, and verification with major clients like Samsung Electronics, ensuring superior quality competitiveness compared to foreign products. The establishment of the Yongin EUV Center minimizes physical distance to clients, maximizing supply stability and collaboration efficiency.Closestrategiccooperation,jointdevelopment,andverificationwithmajorclientslikeSamsungElectronics,ensuringsuperiorqualitycompetitivenesscomparedtoforeignproducts.TheestablishmentoftheYonginEUVCenterminimizesphysicaldistancetoclients,maximizingsupplystabilityandcollaborationefficiency.
Securing a stable cash cow through robust demand in the existing high-end blank mask market. The company possesses significant momentum for a quantum leap in performance due to increased EUV line operations and maximized leverage from core material supply in 2026.Securingastablecashcowthroughrobustdemandintheexistinghigh-endblankmaskmarket.ThecompanypossessessignificantmomentumforaquantumleapinperformanceduetoincreasedEUVlineoperationsandmaximizedleveragefromcorematerialsupplyin2026.
Maintaining a strong market position, ranking 1st or 2nd in the blank mask market within China, demonstrating global market competitiveness.Maintainingastrongmarketposition,ranking1stor2ndintheblankmaskmarketwithinChina,demonstratingglobalmarketcompetitiveness.
Target IndustrieTargetIndustrie
Semiconductor Industry: Manufacturing processes for highly integrated semiconductor circuits, including DRAM and System LSI.SemiconductorIndustry:Manufacturingprocessesforhighlyintegratedsemiconductorcircuits,includingDRAMandSystemLSI.
Display Industry: Manufacturing processes for various display panels, such as TFT-LCD, OLED, and Quantum Dot displays.DisplayIndustry:Manufacturingprocessesforvariousdisplaypanels,suchasTFT-LCD,OLED,andQuantumDotdisplays.
Major MarketsMajorMarkets
South Korea, Taiwan, China, Hong Kong, Singapore, JapanSouthKorea,Taiwan,China,HongKong,Singapore,Japan
Certifications/PatentsCertifications/Patents
A total of 378 patent applications (as of 2025).Atotalof378patentapplications(asof2025).
As of 2013, 231 patent applications, with 60 domestic and 23 international registrations.Asof2013,231patentapplications,with60domesticand23internationalregistrations.
Final victory in a patent invalidation lawsuit against Japanese company Hoya regarding phase-shift blank masks (2009).FinalvictoryinapatentinvalidationlawsuitagainstJapanesecompanyHoyaregardingphase-shiftblankmasks(2009).
Acquisition of patent rights for halftone phase-shift blank masks and their manufacturing methods (2012).Acquisitionofpatentrightsforhalftonephase-shiftblankmasksandtheirmanufacturingmethods(2012).
Joint patent application with Samsung Electronics for EUV pellicles (2025).JointpatentapplicationwithSamsungElectronicsforEUVpellicles(2025).
ISO 9001 certification (2001), Innovative Small & Medium Business (INNO-BIZ) certification (2004), and Specialized Parts & Materials Company certification (2004).ISO9001certification(2001),InnovativeSmall&MediumBusiness(INNO-BIZ)certification(2004),andSpecializedParts&MaterialsCompanycertification(2004).
New Excellent Product (NEP) certification (2005), selection as a World-Class Product (2005 for next-generation, 2009 for current world-class).NewExcellentProduct(NEP)certification(2005),selectionasaWorld-ClassProduct(2005fornext-generation,2009forcurrentworld-class).
Presidential Award at the Small and Medium Business Technology Innovation Exhibition (2005), and selection for the Korea Technology Grand Award and Top 10 New Technologies (2008).PresidentialAwardattheSmallandMediumBusinessTechnologyInnovationExhibition(2005),andselectionfortheKoreaTechnologyGrandAwardandTop10NewTechnologies(2008).
Minister of Knowledge Economy Award (2008 for Parts & Materials, 2009 for Regional Strategic Industry Promotion), and selected as a KOSDAQ Hidden Champion for two consecutive years (2009, 2010).MinisterofKnowledgeEconomyAward(2008forParts&Materials,2009forRegionalStrategicIndustryPromotion),andselectedasaKOSDAQHiddenChampionfortwoconsecutiveyears(2009,2010).
Awarded the '20 Million Dollar Export Tower' (2010), and selected as a 'Small and Medium Business Grand Prize' by Daegu City and the Daegu-Gyeongbuk Regional Headquarters of the Korea Federation of Small and Medium Business (2019).Awardedthe'20MillionDollarExportTower'(2010),andselectedasa'SmallandMediumBusinessGrandPrize'byDaeguCityandtheDaegu-GyeongbukRegionalHeadquartersoftheKoreaFederationofSmallandMediumBusiness(2019).
Awarded as an 'Excellent Company for Autonomous Compliance Trade' on Trade Security Day (2022).Awardedasan'ExcellentCompanyforAutonomousComplianceTrade'onTradeSecurityDay(2022).
Introduction
Location
42 Hosandong-ro, Dalseo District, Daegu, South Korea
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Information
42 Hosandong-ro, Dalseo District, Daegu, South Korea