Information
Japan, 〒222-0033 Kanagawa, Yokohama, Kohoku Ward, Shinyokohama, 2-chōme−１０−１ ビル
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Overview
- Summary
- Lasertec is a company developing, manufacturing, and selling advanced inspection and measurement systems for semiconductor, FPD, and other industries, based on applied optics technology. It holds a dominant position, leading the global market, especially in EUV lithography-related inspection systems.Lasertec is a company developing, manufacturing, and selling advanced inspection and measurement systems for semiconductor, FPD, and other industries, based on applied optics technology. It holds a dominant position, leading the global market, especially in EUV lithography-related inspection systems.
- Key Products/Technologies
- The company possesses a portfolio of mask and wafer inspection equipment as semiconductor-related systems. EUV mask-related systems include Actinic EUV Patterned Mask Inspection Systems (ACTIS A300 Series, A150) and EUV Mask Blanks Inspection and Review Systems (ABICS Series E320, E120). Additionally, DUV Mask Inspection Systems (MATRICS X810EX Series) and various wafer inspection and measurement systems (SiC Wafer Inspection and Review System SICA108, GaN Wafer Inspection and Review System GALOIS211) are offered.The company possesses a portfolio of mask and wafer inspection equipment as semiconductor-related systems. EUV mask-related systems include Actinic EUV Patterned Mask Inspection Systems (ACTIS A300 Series, A150) and EUV Mask Blanks Inspection and Review Systems (ABICS Series E320, E120). Additionally, DUV Mask Inspection Systems (MATRICS X810EX Series) and various wafer inspection and measurement systems (SiC Wafer Inspection and Review System SICA108, GaN Wafer Inspection and Review System GALOIS211) are offered.
- FPD-related systems include FPD photomask inspection systems, developed and supplied by the company.FPD-related systems include FPD photomask inspection systems, developed and supplied by the company.
- The laser microscope product line features high-performance multi-functional hybrid laser microscopes and the Electro-Chemical Reaction Visualizing Confocal System (ECCS B520) for visualizing electrochemical reactions inside lithium-ion batteries.The laser microscope product line features high-performance multi-functional hybrid laser microscopes and the Electro-Chemical Reaction Visualizing Confocal System (ECCS B520) for visualizing electrochemical reactions inside lithium-ion batteries.
- Core technologies include applied optics, confocal optics, DUV/EUV optics, and interferometry, utilizing laser scanning systems and AI/ML-based defect analysis technologies.Core technologies include applied optics, confocal optics, DUV/EUV optics, and interferometry, utilizing laser scanning systems and AI/ML-based defect analysis technologies.
- Core Advantages
- A dominant position in the EUV mask inspection market. The company holds over 90% global market share in actinic EUV patterned mask defect inspection systems, EUV mask blank defect inspection/review systems, and EUV mask backside inspection/cleaning systems.A dominant position in the EUV mask inspection market. The company holds over 90% global market share in actinic EUV patterned mask defect inspection systems, EUV mask blank defect inspection/review systems, and EUV mask backside inspection/cleaning systems.
- A commitment to cutting-edge product and technology development with the spirit of "launching completely new products into the world every year," resulting in numerous "world's first" products. The world's first EUV mask blank inspection and review system using 13.5nm EUV light was released in 2017.A commitment to cutting-edge product and technology development with the spirit of "launching completely new products into the world every year," resulting in numerous "world's first" products. The world's first EUV mask blank inspection and review system using 13.5nm EUV light was released in 2017.
- Continuous pursuit of innovation through R&D investment, dedicating 5-10% of annual sales to research and development. Over 30 new patents were filed in 2022, focusing on advanced lithography technologies.Continuous pursuit of innovation through R&D investment, dedicating 5-10% of annual sales to research and development. Over 30 new patents were filed in 2022, focusing on advanced lithography technologies.
- Close collaboration with major semiconductor manufacturers (foundries, IDMs, memory makers) for co-development of products aligned with customer roadmaps. This strategy provides essential solutions for next-generation chip manufacturing, maintaining high customer loyalty.Close collaboration with major semiconductor manufacturers (foundries, IDMs, memory makers) for co-development of products aligned with customer roadmaps. This strategy provides essential solutions for next-generation chip manufacturing, maintaining high customer loyalty.
- A fab-lite strategy, outsourcing production to external partners and concentrating internal resources on R&D, maximizing technological development capabilities. Engineers are involved in all stages from product planning to research, prototyping, design, manufacturing, installation, and maintenance, possessing multifaceted problem-solving abilities.A fab-lite strategy, outsourcing production to external partners and concentrating internal resources on R&D, maximizing technological development capabilities. Engineers are involved in all stages from product planning to research, prototyping, design, manufacturing, installation, and maintenance, possessing multifaceted problem-solving abilities.
- A critical supplier role in addressing the key bottleneck of mask defect inspection for EUV lithography, in line with the global semiconductor industry's trend towards miniaturization and increasing complexity.A critical supplier role in addressing the key bottleneck of mask defect inspection for EUV lithography, in line with the global semiconductor industry's trend towards miniaturization and increasing complexity.
- Target Industries
- Semiconductor Industry: Mask and wafer inspection in EUV lithography processes, quality and yield improvement in next-generation semiconductor device manufacturing.Semiconductor Industry: Mask and wafer inspection in EUV lithography processes, quality and yield improvement in next-generation semiconductor device manufacturing.
- Flat Panel Display (FPD) Industry: High-resolution FPD photomask inspection, photomask inspection necessary for organic LED panel production.Flat Panel Display (FPD) Industry: High-resolution FPD photomask inspection, photomask inspection necessary for organic LED panel production.
- Energy and Environment Sector: SiC wafer inspection, GaN wafer inspection, visualization of electrochemical reactions inside lithium-ion batteries.Energy and Environment Sector: SiC wafer inspection, GaN wafer inspection, visualization of electrochemical reactions inside lithium-ion batteries.
- Research and Development and Quality Control: R&D and quality control in various industrial fields such as semiconductor materials, transparent films, coating materials, inorganic/organic materials, biological samples, metal parts, and plastic components.Research and Development and Quality Control: R&D and quality control in various industrial fields such as semiconductor materials, transparent films, coating materials, inorganic/organic materials, biological samples, metal parts, and plastic components.
- Advanced Packaging: Inspection related to HBM (High Bandwidth Memory) supply chain growth, including 2.5D/3D, micro-bump, TSV, hybrid bond, and RDL inspection.Advanced Packaging: Inspection related to HBM (High Bandwidth Memory) supply chain growth, including 2.5D/3D, micro-bump, TSV, hybrid bond, and RDL inspection.
- Major Markets
- Taiwan, South Korea, Japan, Asia-Pacific region (including China)Taiwan, South Korea, Japan, Asia-Pacific region (including China)
- EuropeEurope
- United StatesUnited States
- Certifications/Patents
- Possession of a total of 487 patents globally, with 231 active patents. The highest number of patent applications in Japan, the United States, and Germany.Possession of a total of 487 patents globally, with 231 active patents. The highest number of patent applications in Japan, the United States, and Germany.
- Numerous awards for technological and quality excellence. Recipient of the Commissioner of Japan Patent Office Award from the Ministry of Economy, Trade and Industry in 2013.Numerous awards for technological and quality excellence. Recipient of the Commissioner of Japan Patent Office Award from the Ministry of Economy, Trade and Industry in 2013.
- Consecutive recipient of Intel's EPIC Supplier Award in 2025, 2024, and 2023, recognizing top-tier partnership and performance within the supply chain.Consecutive recipient of Intel's EPIC Supplier Award in 2025, 2024, and 2023, recognizing top-tier partnership and performance within the supply chain.
- Recipient of TSMC's Excellent Performance Award in 2023 for "Distinguished EUV Mask Inspection and Metrology Collaboration".Recipient of TSMC's Excellent Performance Award in 2023 for "Distinguished EUV Mask Inspection and Metrology Collaboration".
- Awards including the BACUS Prize and Best Paper Presentation Award at the SPIE Photomask Technology + EUVL Exhibition 2023.Awards including the BACUS Prize and Best Paper Presentation Award at the SPIE Photomask Technology + EUVL Exhibition 2023.
- Key patents include Measurement apparatus and measurement method (US11486693), Optical device, and method for preventing contamination of optical device (US11353802), and EUV mask inspection device (US12361536).Key patents include Measurement apparatus and measurement method (US11486693), Optical device, and method for preventing contamination of optical device (US11353802), and EUV mask inspection device (US12361536).
Introduction
Location
Japan, 〒222-0033 Kanagawa, Yokohama, Kohoku Ward, Shinyokohama, 2-chōme−１０−１ ビル
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