Information
Chase House, City Junction Business Park, Dublin, D17 AK63, Ireland
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Overview
- Summary
- Impedans is a leading provider of innovative plasma and RF measurement technology. The company offers advanced sensors and systems crucial for accurate process measurement, stability, and repeatability in nano-scale manufacturing. Its solutions are utilized across various industries and applications, including fundamental research, equipment design, calibration, testing, process development, and control.Impedans is a leading provider of innovative plasma and RF measurement technology. The company offers advanced sensors and systems crucial for accurate process measurement, stability, and repeatability in nano-scale manufacturing. Its solutions are utilized across various industries and applications, including fundamental research, equipment design, calibration, testing, process development, and control.
- Key Products/Technologies
- Bulk Plasma Sensors: The Langmuir Probe system measures key plasma parameters such as plasma potential, charged particle density (electron & ion), and electron temperature. The Plato Probe is a planar Langmuir Probe designed for deposition plasmas, capable of accurately measuring plasma parameters through insulating films several tens of microns thick.Bulk Plasma Sensors: The Langmuir Probe system measures key plasma parameters such as plasma potential, charged particle density (electron & ion), and electron temperature. The Plato Probe is a planar Langmuir Probe designed for deposition plasmas, capable of accurately measuring plasma parameters through insulating films several tens of microns thick.
- Substrate Level Sensors: The Semion Retarding Field Energy Analyser (RFEA) system provides real-time measurements of ion flux and ion energy distribution impacting a surface. The Semion 3 keV is a single sensor for measuring ion energy with RF bias up to 3kV peak-to-peak. The Quantum system combines RFEA with an integrated quartz crystal microbalance (QCM) to measure ion energy distribution function (IEDF) and ion-neutral deposition ratio.Substrate Level Sensors: The Semion Retarding Field Energy Analyser (RFEA) system provides real-time measurements of ion flux and ion energy distribution impacting a surface. The Semion 3 keV is a single sensor for measuring ion energy with RF bias up to 3kV peak-to-peak. The Quantum system combines RFEA with an integrated quartz crystal microbalance (QCM) to measure ion energy distribution function (IEDF) and ion-neutral deposition ratio.
- RF Voltage-Current (VI) Probes: These sensors measure radio frequency (RF) parameters, offering accurate in-line RF power and impedance measurements in continuous wave and pulsed RF applications. They can measure parameters for up to 15 harmonics of the fundamental frequency, recreate RF waveforms, and predict plasma ion flux. The Octiv range boasts 1% power measurement accuracy for VSWR up to 6.0:1 and highly accurate impedance measurement across a wide range.RF Voltage-Current (VI) Probes: These sensors measure radio frequency (RF) parameters, offering accurate in-line RF power and impedance measurements in continuous wave and pulsed RF applications. They can measure parameters for up to 15 harmonics of the fundamental frequency, recreate RF waveforms, and predict plasma ion flux. The Octiv range boasts 1% power measurement accuracy for VSWR up to 6.0:1 and highly accurate impedance measurement across a wide range.
- Moduli RF Spectrometer: A non-invasive RF detector that directly monitors harmonics emitted by a plasma from outside the chamber. Ideal for scenarios where in-line RF sensor integration is impractical, it is used for endpoint detection and fault detection in production tools.Moduli RF Spectrometer: A non-invasive RF detector that directly monitors harmonics emitted by a plasma from outside the chamber. Ideal for scenarios where in-line RF sensor integration is impractical, it is used for endpoint detection and fault detection in production tools.
- Core Advantages
- A leading provider of innovative plasma and RF measurement technology. The company delivers accurate process measurement, stability, and repeatability essential for the future of nano-scale manufacturing.A leading provider of innovative plasma and RF measurement technology. The company delivers accurate process measurement, stability, and repeatability essential for the future of nano-scale manufacturing.
- Deep expertise and support from a team of plasma physicists and engineers. Comprehensive support is available throughout the entire process, from initial consultation to ongoing maintenance.Deep expertise and support from a team of plasma physicists and engineers. Comprehensive support is available throughout the entire process, from initial consultation to ongoing maintenance.
- Adherence to high standards in quality management, employee safety, and environmental sustainability through ISO 9001, ISO 45001, and ISO 14001 certifications. This ensures consistent delivery of products and services that exceed customer expectations.Adherence to high standards in quality management, employee safety, and environmental sustainability through ISO 9001, ISO 45001, and ISO 14001 certifications. This ensures consistent delivery of products and services that exceed customer expectations.
- Proprietary patented technologies such as the PlatoProbe. This is the only Langmuir Probe system capable of accurately measuring plasma parameters through deposited layers in high deposition rate plasma environments.Proprietary patented technologies such as the PlatoProbe. This is the only Langmuir Probe system capable of accurately measuring plasma parameters through deposited layers in high deposition rate plasma environments.
- Market-leading Langmuir Probe system with an 80 MS/s sampling rate. This capability allows for pulse profiling and single-shot plasma measurements with unparalleled time resolution.Market-leading Langmuir Probe system with an 80 MS/s sampling rate. This capability allows for pulse profiling and single-shot plasma measurements with unparalleled time resolution.
- NIST-traceable 1% accuracy in RF power and impedance measurements. Advanced calibration methodologies maintain accuracy across the widest VSWR range available in the market.NIST-traceable 1% accuracy in RF power and impedance measurements. Advanced calibration methodologies maintain accuracy across the widest VSWR range available in the market.
- Target Industries
- Semiconductor Manufacturing: For process development, live process monitoring, and equipment maintenance.Semiconductor Manufacturing: For process development, live process monitoring, and equipment maintenance.
- Research and Development: Utilized by universities and research institutes for plasma physics research, equipment development, process development, and model validation.Research and Development: Utilized by universities and research institutes for plasma physics research, equipment development, process development, and model validation.
- Vacuum Coating: For the development of high-quality thin films.Vacuum Coating: For the development of high-quality thin films.
- Solar: Improving solar cell efficiency through plasma surface activation expertise.Solar: Improving solar cell efficiency through plasma surface activation expertise.
- Aerospace and Military: Enhancing material coating performance, thruster performance, and fundamental plasma research.Aerospace and Military: Enhancing material coating performance, thruster performance, and fundamental plasma research.
- Medical Device Manufacturing: Improving performance, yield, and throughput of surface activation processes.Medical Device Manufacturing: Improving performance, yield, and throughput of surface activation processes.
- RF Power: Applications in telecommunications, broadcast, RF sterilization, RF heating, and radar industries.RF Power: Applications in telecommunications, broadcast, RF sterilization, RF heating, and radar industries.
- Flat Panel, Thin Film, and Hard Disk industries.Flat Panel, Thin Film, and Hard Disk industries.
- Major Markets
- South Korea (Based on Komachine information)South Korea (Based on Komachine information)
- Ireland (Headquarters), Switzerland (CERN)Ireland (Headquarters), Switzerland (CERN)
- USA (Applied Materials)USA (Applied Materials)
- Australia (Australian National University)Australia (Australian National University)
- Certifications/Patents
- ISO 9001 (Quality Management System) Certification.ISO 9001 (Quality Management System) Certification.
- ISO 45001 (Occupational Health and Safety Management System) Certification.ISO 45001 (Occupational Health and Safety Management System) Certification.
- ISO 14001 (Environmental Management System) Certification.ISO 14001 (Environmental Management System) Certification.
- Patent Number 12399474: Controller for a matching unit of a plasma processing system.Patent Number 12399474: Controller for a matching unit of a plasma processing system.
- Patent Number 12136542: Apparatus for ion energy analysis of plasma processes.Patent Number 12136542: Apparatus for ion energy analysis of plasma processes.
- Patent Number 11908668: Apparatus for ion energy analysis of plasma processes.Patent Number 11908668: Apparatus for ion energy analysis of plasma processes.
- Patent Number 9263236: Sensing of plasma process parameters.Patent Number 9263236: Sensing of plasma process parameters.
- PlatoProbe's ultrafast biasing technology is a patented method for accurate plasma parameter measurement through deposited films.PlatoProbe's ultrafast biasing technology is a patented method for accurate plasma parameter measurement through deposited films.
Introduction
Location
Chase House, City Junction Business Park, Dublin, D17 AK63, Ireland
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