Information
111 Yeongok-gil, Ipjang-myeon, Seobuk-gu, Cheonan, Chungcheongnam-do, South Korea
+82 41-568-7944
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Overview
- Summary
- Ecoenergen specializes in manufacturing air pollutant treatment devices and providing total solutions for the semiconductor and various industrial sectors. The company proactively addresses environmental challenges stemming from accelerating energy resource depletion and advanced industrial development, positioning itself as an eco-friendly equipment expert. Leveraging accumulated technological know-how from the semiconductor equipment business and securing new plasma technologies, it aims for global competitiveness beyond mere import substitution. A primary focus involves leading greenhouse gas reduction technologies and delivering sustainable environmental solutions.Ecoenergen specializes in manufacturing air pollutant treatment devices and providing total solutions for the semiconductor and various industrial sectors. The company proactively addresses environmental challenges stemming from accelerating energy resource depletion and advanced industrial development, positioning itself as an eco-friendly equipment expert. Leveraging accumulated technological know-how from the semiconductor equipment business and securing new plasma technologies, it aims for global competitiveness beyond mere import substitution. A primary focus involves leading greenhouse gas reduction technologies and delivering sustainable environmental solutions.
- Key Products/Technologies
- De-NOx System: An NOx reduction facility implementing a unique room-temperature oxidation-reduction technology, achieving 99% treatment efficiency at 25℃, unlike conventional high-temperature systems. It integrates AC plasma oxidation, DC potential difference dust collection, and Wet Scrubber reduction for simultaneous treatment of complex pollutants like NOx, HF, and dust.De-NOx System: An NOx reduction facility implementing a unique room-temperature oxidation-reduction technology, achieving 99% treatment efficiency at 25℃, unlike conventional high-temperature systems. It integrates AC plasma oxidation, DC potential difference dust collection, and Wet Scrubber reduction for simultaneous treatment of complex pollutants like NOx, HF, and dust.
- Bay Catalyst System: A core technology for decomposing perfluorocarbons (PFCs) generated in semiconductor etching processes by 99% through catalytic reactions. This system converts PFCs into carbon dioxide and hydrogen fluoride, efficiently treating exhaust gases from over 20 etching tools with a single unit.Bay Catalyst System: A core technology for decomposing perfluorocarbons (PFCs) generated in semiconductor etching processes by 99% through catalytic reactions. This system converts PFCs into carbon dioxide and hydrogen fluoride, efficiently treating exhaust gases from over 20 etching tools with a single unit.
- Wet-EP System (Bay/Middle Type, Roof Type): Designed for POU SCR' exhaust SUB DUCT and Middle Duct, these systems reduce high-concentration/low-flow pollutants and treat corrosive gases and particulate matter.Wet-EP System (Bay/Middle Type, Roof Type): Designed for POU SCR' exhaust SUB DUCT and Middle Duct, these systems reduce high-concentration/low-flow pollutants and treat corrosive gases and particulate matter.
- POU Scrubber (Plasma & Wet EP, Heat & Wet EP): Equipment for primary treatment of PFCs gas, water-soluble substances, powder, and mist discharged from semiconductor processes. It utilizes plasma and electrostatic precipitation principles for high-efficiency gas treatment, offering economical operation and maintenance.POU Scrubber (Plasma & Wet EP, Heat & Wet EP): Equipment for primary treatment of PFCs gas, water-soluble substances, powder, and mist discharged from semiconductor processes. It utilizes plasma and electrostatic precipitation principles for high-efficiency gas treatment, offering economical operation and maintenance.
- IPA Scrubber System: Effectively treats pollutants such as IPA and NH3 generated in semiconductor processes using a Mist & E.P-Wet system. This ensures compliance with environmental regulations and prevents local complaints.IPA Scrubber System: Effectively treats pollutants such as IPA and NH3 generated in semiconductor processes using a Mist & E.P-Wet system. This ensures compliance with environmental regulations and prevents local complaints.
- De-NH3 System: A treatment system designed to reduce ammonia (NH3) emission concentrations.De-NH3 System: A treatment system designed to reduce ammonia (NH3) emission concentrations.
- WWFS (Waste Water Free System): An environmentally friendly system that minimizes wastewater generation.WWFS (Waste Water Free System): An environmentally friendly system that minimizes wastewater generation.
- GPM (Gas-treatment Plasma Module) & Wet EP, GPS (Gas-treatment Plasma System): Gas treatment modules and systems leveraging advanced plasma technology.GPM (Gas-treatment Plasma Module) & Wet EP, GPS (Gas-treatment Plasma System): Gas treatment modules and systems leveraging advanced plasma technology.
- Core Advantages
- Unique Greenhouse Gas Reduction Technology: The Bay Catalyst System, which decomposes PFCs from semiconductor etching processes by 99% through room-temperature catalytic reactions, and the De-NOx system, achieving 99% NOx treatment efficiency at room temperature, are recognized as the world's only room-temperature oxidation-reduction technologies. This enables stable operation even in heat-sensitive semiconductor manufacturing environments.Unique Greenhouse Gas Reduction Technology: The Bay Catalyst System, which decomposes PFCs from semiconductor etching processes by 99% through room-temperature catalytic reactions, and the De-NOx system, achieving 99% NOx treatment efficiency at room temperature, are recognized as the world's only room-temperature oxidation-reduction technologies. This enables stable operation even in heat-sensitive semiconductor manufacturing environments.
- Total Solution Provision Capability: Offering optimized air pollutant treatment device manufacturing and total solutions to clients, demonstrating comprehensive response capabilities to air pollutant issues in semiconductor and various industrial sectors.Total Solution Provision Capability: Offering optimized air pollutant treatment device manufacturing and total solutions to clients, demonstrating comprehensive response capabilities to air pollutant issues in semiconductor and various industrial sectors.
- Technological Know-how and R&D Investment: Continuously securing technological know-how accumulated from semiconductor equipment manufacturing and new plasma technologies, with an in-house research institute driving ongoing research achievements. Expertise in gas flow analysis design for optimal fine dust and harmful gas removal, along with positive (+) discharge Corona technology.Technological Know-how and R&D Investment: Continuously securing technological know-how accumulated from semiconductor equipment manufacturing and new plasma technologies, with an in-house research institute driving ongoing research achievements. Expertise in gas flow analysis design for optimal fine dust and harmful gas removal, along with positive (+) discharge Corona technology.
- ESG Management and Market Scalability: Presenting solutions for global warming and atmospheric environmental issues, holding strong solutions in the scrubber sector where ESG management is gaining prominence. Actively pursuing overseas market expansion based on verified domestic performance, growing as a global hidden champion.ESG Management and Market Scalability: Presenting solutions for global warming and atmospheric environmental issues, holding strong solutions in the scrubber sector where ESG management is gaining prominence. Actively pursuing overseas market expansion based on verified domestic performance, growing as a global hidden champion.
- Simultaneous Treatment of Complex Pollutants: Possessing technology for efficiently treating various complex pollutants simultaneously, including nitrogen oxides, hydrogen fluoride, and fine dust. This strength allows effective compliance with complex environmental regulations in diverse industrial settings.Simultaneous Treatment of Complex Pollutants: Possessing technology for efficiently treating various complex pollutants simultaneously, including nitrogen oxides, hydrogen fluoride, and fine dust. This strength allows effective compliance with complex environmental regulations in diverse industrial settings.
- Skilled Technical Workforce: A significant number of technical experts with decades of field experience in the scrubber sector, representing a strong human resource advantage.Skilled Technical Workforce: A significant number of technical experts with decades of field experience in the scrubber sector, representing a strong human resource advantage.
- Target Industrie
- Electronics Industry (Semiconductor manufacturing processes)Electronics Industry (Semiconductor manufacturing processes)
- Chemical IndustryChemical Industry
- General IndustryGeneral Industry
- Major Markets
- Taiwan, China, MalaysiaTaiwan, China, Malaysia
- United States (Technology introduction in progress)United States (Technology introduction in progress)
- Certifications/Patents
- ISO 45001:2018 (Occupational Health and Safety Management System) CertificationISO 45001:2018 (Occupational Health and Safety Management System) Certification
- ISO 14001:2015 (Environmental Management System) CertificationISO 14001:2015 (Environmental Management System) Certification
- ISO 9001:2015 (Quality Management System) CertificationISO 9001:2015 (Quality Management System) Certification
- Confirmation as a Technology Innovative Small and Medium-sized Enterprise (INNOBIZ)Confirmation as a Technology Innovative Small and Medium-sized Enterprise (INNOBIZ)
- Certification of Corporate R&D CenterCertification of Corporate R&D Center
- Registration for Environmental Engineering BusinessRegistration for Environmental Engineering Business
- Construction Business RegistrationConstruction Business Registration
- Patent: System for Simultaneous Treatment of Nitrogen Oxides and Fine Particulate Matter (KR20150010235A)Patent: System for Simultaneous Treatment of Nitrogen Oxides and Fine Particulate Matter (KR20150010235A)
- Patent: Gas Scrubber System for Simultaneous Removal of Ammonia Gas and Salts (Registered October 2022)Patent: Gas Scrubber System for Simultaneous Removal of Ammonia Gas and Salts (Registered October 2022)
- Patent: Salt Removal Device Using Ultrasonic Electrode Aggregation and Gas Scrubber System Including the Same (Registered March 2023)Patent: Salt Removal Device Using Ultrasonic Electrode Aggregation and Gas Scrubber System Including the Same (Registered March 2023)
- Patent: Flammable Gas Treatment Device (Registered January 2016)Patent: Flammable Gas Treatment Device (Registered January 2016)
- Patents: Possessing technologies related to complex waste gas treatment devices and waste gas treatment systems and methodsPatents: Possessing technologies related to complex waste gas treatment devices and waste gas treatment systems and methods
Introduction
Location
111 Yeongok-gil, Ipjang-myeon, Seobuk-gu, Cheonan, Chungcheongnam-do, South Korea
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