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Ion Sputter Coater-II
모델명
시리즈
Option&Sample Prep.
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결제 방법
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납기 정보
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배송 정보
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원산지
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제품 상세 설명
Ion Sputter Coater-II (PVD for R&D)
설명 : Ion Sputter Coater/Thermal-evaporation/Glow-discharge, Plasma treatment
특징
- 간편한 3가지 모드변경!
- 코팅 : Ion Sputter Coater
- 증착 : Thermal-evaporation
- 아크방전 : Glow-discharge, Plasma treatment
- Au, Pt , Carbon 등 다양한 Target 사용가능
제품사양
| HIGHLIGHTS AND FEATURES |
| Light-weight design aluminum receptacle |
| Glass reaction cylinder Ø120mm (DIN 100 ISO-KF compatible) |
| Implosion guard and safety monitoring |
| Round stage, height-adjustable, and tiltable (Ø80mm) to hold your samples. The table can be easily removed without tools for cleaning purposes. |
| Speed-controlled rotary or planetary gear table with different options for holding samples (option) |
| Coat-thickness measurement via double-quartz measuring system (small samples at the center, large samples at the edge) |
| Wide range power supply (90-260VAC) |
| Interface for different process heads with automatic recognition |
| 5.7“ TFT-Touch graphical display |
| Easy creation of coating formulations, which guarantee reproducible results |
| Storage/view of the last ten processes |
| Feature for automatic flooding of system in the event of power loss. This prevents the system from becoming contaminated with backing pump oil. |
| Intuitive user software with many practical features |
| Graphical representation of process data with Windows-based Coating LAB software |
| Etc.. |
| – Flange connection (DN 25 ISO-KF) for connecting an external backing pump (LV version) – Can be used as a pure pumping unit – External alarm output – USB interface for easy analysis and update of software – Automatic valve control for two process gases and venting – 6mm Legris connections for two process gases and a venting gas – Tools for target and quartz replacement – USB service cable – Power supply cable – Various accessories and mounting materials included in scope of delivery |