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코리아바큠테크

031-987-6320
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코리아바큠테크

코리아바큠테크

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모델명

시리즈

Etcher


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원산지

대한민국


031-987-6320

제품 상세 설명

Overview

An Inductively Coupled Plasma (ICP) is a type of plasma source in which the energy is

supplied by electrical currents produced by electromagnetic induction; that is, by time-

varying magnetic fields. In its simplest form, an inductively coupled plasma consists of a

vacuum vessel, into which the gas to be ionized is administered, and an induction coil,

driven by a source of RF power. The coil is generally separated from the vacuum region

by a dielectric window. The wide range of applications for RF-driven, inductively

coupled plasma sources has recently expanded into processing tools for coating or

etching systems in the microelectronics industry.


System configuration

Substrate size

2” - 6” (50.8mm - 150mm)

Etch Uniformity

1.06±% within 3” wafer

Etch rate

Process Chamber

Al anodized Chamber

He backside cooling / Bias / Chiller (-20℃ ~ 50℃)

ICP source with plasma spiral coil


Korea Vacuum Tech  ICP-RIE Series

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