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모델명 E-beam & Sputter Series
시리즈 Evaporator
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Overview

An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.

 

Features

 ≻ Excellent Thickness Uniformity

        The KVE Series E-Beam&Sputter Evaporator System provide excellent thickness uniformity of

        resultant films. And if you deposit the thin films to same condition, you will get the thin

        films of same feature.

≻ Combination system

        This system has E-beam source and sputtering source. Therefore, you can deposit

        thin films of various properties.

Specifications

ITEM

SPECIFICATIONS

Process Chamber

Stainless steel

Vacuum Pumping Station

Cryo, TMP

Loadlock Chamber

Optional item

Substrate Unit

Rotation / Heating

Sample Size

4inch ~

Process pressure

< 5.0E-4Torr

Vacuum Gauge Controller

ATM ~ 1.0E-10Torr

Power Supply Unit

6kW, 8kW, 10kW

Crucible Size

4cc, 7cc, 15cc, 25cc

Pocket Number

Single, 4,6

Sputtering Cathode

4”,6” 600W, 1000W

Film Thickness Uniformity

< ±5%

Ultimate Pressure

< 5.0E-7Torr

System Control

PC auto / PLC Semi-auto

Korea Vacuum Tech  E-beam & Sputter Series

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