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모델명 E-beam & Sputter Series
시리즈 Evaporator


An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.



 ≻ Excellent Thickness Uniformity

        The KVE Series E-Beam&Sputter Evaporator System provide excellent thickness uniformity of

        resultant films. And if you deposit the thin films to same condition, you will get the thin

        films of same feature.

≻ Combination system

        This system has E-beam source and sputtering source. Therefore, you can deposit

        thin films of various properties.




Process Chamber

Stainless steel

Vacuum Pumping Station

Cryo, TMP

Loadlock Chamber

Optional item

Substrate Unit

Rotation / Heating

Sample Size

4inch ~

Process pressure

< 5.0E-4Torr

Vacuum Gauge Controller

ATM ~ 1.0E-10Torr

Power Supply Unit

6kW, 8kW, 10kW

Crucible Size

4cc, 7cc, 15cc, 25cc

Pocket Number

Single, 4,6

Sputtering Cathode

4”,6” 600W, 1000W

Film Thickness Uniformity

< ±5%

Ultimate Pressure

< 5.0E-7Torr

System Control

PC auto / PLC Semi-auto

Korea Vacuum Tech  E-beam & Sputter Series

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