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코리아바큠테크

코리아바큠테크

코리아바큠테크

코리아바큠테크

031-987-6320
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코리아바큠테크

코리아바큠테크

Evaporator

모델명

시리즈

Evaporator


구매 안내

아래는 참고용 정보이므로 세부 조건은 반드시 제조사/판매자에게 문의 바랍니다.

결제 방법

제조사/판매자에게 문의 바랍니다.

납기 정보

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배송 정보

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원산지

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031-987-6320

제품 상세 설명

Korea Vacuum Tech  E-BEAM Series

Korea Vacuum Tech  E-BEAM Series 1


Korea Vacuum Tech  E-BEAM Series 2


Korea Vacuum Tech  E-BEAM Series 3

Korea Vacuum Tech  E-BEAM Series 4

Overview

 An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.

≻ Excellent Thickness Uniformity

        The KVE Series KVE-2000L System provide excellent thickness uniformity of resultant films.

     ≻ Always maintain high vacuum degree in process

        These systems have a process chamber and a loadlock chamber. Loadlock chamber is used

        for sample loading. So process chamber is always maintained high vacuum state

     ≻ Semi-auto system control by PLC


Process Chamber

Stainless steel

Vacuum Pumping Station

Cryo / TMP

Loadlock Chamber

Top door, Stainless steel

Substrate Unit

Rotation / Heating / Cooling

Sample Size

4inch ~

Vacuum Gauge Controller

ATM ~ 1.0E-10Torr

Power Supply Unit

6kW, 8kW, 10kW

Crucible Size

4cc, 7cc, 15cc, 25cc

Pocket Number

Single, 4, 6

Film Thickness Uniformity

< ±5%

Ultimate Pressure

< 5.0E-7Torr

System Control

PLC based Semi-auto


Korea Vacuum Tech  E-BEAM Series 5

Korea Vacuum Tech  E-BEAM Series 6

Overview

 An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.

≻ Excellent Thickness Uniformity

        The KVE Series KVE-E2000 System provide excellent thickness uniformity of

        resultant films even for substrates that have the same diameter as the sputtering cathode assembly

≻ No loadlock chamber

≻ Semi-auto system control by PLC


Process Chamber

Stainless steel

Vacuum Pumping Station

Cryo / TMP

Loadlock Chamber

Substrate Unit

Rotation / Heating / Cooling

Sample Size

4inch ~

Vacuum Gauge Controller

ATM ~ 1.0E-10Torr

Power Supply Unit

6kW, 8kW, 10kW

Crucible Size

4cc, 7cc, 15cc, 25cc

Pocket Number

Single, 4, 6

Film Thickness Uniformity

< ±5%

Ultimate Pressure

< 5.0E-7Torr

System Control

PLC based Semi-auto


Korea Vacuum Tech  E-BEAM Series 7

Korea Vacuum Tech  E-BEAM Series 8

Overview

An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.

Features

≻ Excellent Thickness Uniformity

        The KVE Series  E-Beam Evaporator System provide excellent thickness uniformity of 

        resultant films. if you deposit the thin film under same conditions, you will get a thin films 

        of same characteristics.

≻ Full Auto control

        These systems provide the ‘auto button’ to user for convenience of user. Fully automated

        vacuum process control system.

≻ Always maintain high vacuum degree in process

        These systems have a process chamber and a loadlock chamber. Loadlock chamber is used

        for sample loading. So process chamber is always maintained high vacuum state.


Process Chamber

Stainless steel

Vacuum Pumping Station

Cryo / TMP

Loadlock Chamber

Top door, Stainless steel

Substrate Unit

Rotation / Heating / Cooling

Sample Size

4inch ~

Vacuum Gauge Controller

ATM ~ 1.0E-10Torr

Power Supply Unit

6kW, 8kW, 10kW

Crucible Size

4cc, 7cc, 15cc, 25cc

Pocket Number

Single, 4, 6

Film Thickness Uniformity

< ±5%

Ultimate Pressure

< 5.0E-7Torr

System Control

PLC based PC auto


Korea Vacuum Tech  E-BEAM Series 9

Korea Vacuum Tech  E-BEAM Series 10

Overview

An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.

 

Features

≻ Excellent Thickness Uniformity

    The KVE Series E-Beam Evaporator System provide excellent thickness uniformity of 

    resultant films. if you deposit the thin film under same conditions, you will get a thin films 

    of same characteristics

Full Auto control

    These systems provide the ‘auto button’ to user for convenience of user. Fully automated

    vacuum process control system


Specifications

Process Chamber

Stainless steel

Vacuum Pumping Station

Cryo / TMP

Loadlock Chamber

Substrate Unit

Rotation / Heating / Cooling

Sample Size

4inch ~

Vacuum Gauge Controller

ATM ~ 1.0E-10Torr

Power Supply Unit

6kW, 8kW, 10kW

Crucible Size

4cc, 7cc, 15cc, 25cc

Pocket Number

Single, 4, 6

Film Thickness Uniformity

< ±5%

Ultimate Pressure

< 5.0E-7Torr

System Control

PLC based PC auto


Korea Vacuum Tech  E-BEAM Series 11

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