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ALPSITEC

ALPSITEC

CMP Machines Pcox 200s

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Prototyping and Small Series


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Advantages

Price

Small, easy-to-use, robust

Direct transfer of processes developed on the Pcox200 S to a Pcox20X production machines

Possible and easy evolution of a Pcox200 S module into a Pcox20X machine ensuring long tool life without

obsolescence.

 


Using

The Pcox 20X range presents a series of modular machines which offers configurations including 2, 3 or 4 polishing modules.

The Pcox 200 S is one of these modules used in stand-alone form for process development It offers all the specifications of the production machine :

-Complete control by computer and PLC

-Automatic loading and unloading of the polishing head

-Ten polishing steps

-Standard 200 mm

-Compatibility 4 “to 8”

-Ex-situ and in-situ conditioning

-Integrated slurry pump

-Unique quick exchange of platen, polishing carriers and conditioning tools.

Its structure offers the same productivity specifications as a module included in a Pcox20X machine although with manual loading of the wafer to save space and cost.

 


Specifications

Rack
Wafer diameter <= 200 mm
Rotation speed 15 – 150 rpm
Back pressure 0 – 100 kPa
Pressing force 0 – 3000 N
Scan amplitude 0 – maximum
Scan speed 0 – 0.35 m/s
   
Tray
Diameter 550 mm
Rotation speed 15 – 150 rpm
Temperature 10 – 60°C
Abrasive 0 – 250 ml/min
Conditioner
Tool type brush, disc, diamond ring
Tool diameter 100 – 225 mm
Force 20 – 300 N
Rotation speed 10 – 70 rpm
Scan speed 0 – 0.9 m/s
End point
Module prepared for interfacing with a system for detecting the end of attack DFA2 system from Alpsitec or other system.
Power
Head motor 0.75 kW
Platen motor 2.20 kW
Conditioning motor 0.37 kW
Facilities
Voltage 220V Tri or 400V tri
Compressed air 6 bars
Nitrogen 2 bars
DI water 1 bar
Consumption
Electricity 1 – 2 KWH
DI water 100 L/hour
Vaccum internal vacuum pump
Dimensions
Width 950 mm
Depth 1190 mm
Height 2480 mm
Weight 1000 kg
Wafer dimension 4’’ to 200 mm
Retrofit kit 4″, 5″, 6″
Option module autoloading cassette 1

These characteristics may be modified depending on the evolution of equipment.

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