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Product Name Wafer Flux cleaning System
Model WEFC-2500 W
Series Semiconductor
Catalog
Product Description

Product Description
 
This machine cleans the wafer by removing the flux on the wafer(300mm) bumped with balls. 
 It cleans the wafer using DI water and high pressure spray, transfers it on the silicone coated SUS Inlet Conveyor belt automatically. 

 
Specification

Model WEFC-2500 W
Wafer Size 300 mm Wafer
Conveyor speed 100 ㎜ /min ± 300 ㎜ /min

Di Wash Pressure zone

TOP 3 ~6 ㎏ / ㎠

BOTTOM 1~3 ㎏ / ㎠

Air Blow Zone

TOP : 500 ~ 10 00mmH2O (7.5 HP)

BOTTOM : 300 ~ 8 00mmH2O (5 HP)

Hot Dry Zone 100℃±10℃
Dimension(D.I) 2,050(L) × 1,450(W) × 2,000(H) mm
Inlet conveyor belt (D.I) 2,800(L) × 450(W) mm {Silicon Coating}
Power AC380 V ø 3 200A 60 ㎐

 

Feature
 
- User Management System for easy transport 
- DI water purity Check System 
- Top pressure SYSTEM 
- Reduces excessive water usage. 
- Open the front panel

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