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Korea Vacuum Tech

Korea Vacuum Tech

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Model

Series

Etcher


Transaction Process

Please contact the manufacturer/supplier.

Payment

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Delivery

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Shipment

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Origin

Korea (Republic of)


Description

Overview

An Inductively Coupled Plasma (ICP) is a type of plasma source in which the energy is

supplied by electrical currents produced by electromagnetic induction; that is, by time-

varying magnetic fields. In its simplest form, an inductively coupled plasma consists of a

vacuum vessel, into which the gas to be ionized is administered, and an induction coil,

driven by a source of RF power. The coil is generally separated from the vacuum region

by a dielectric window. The wide range of applications for RF-driven, inductively

coupled plasma sources has recently expanded into processing tools for coating or

etching systems in the microelectronics industry.


System configuration

Substrate size

2” - 6” (50.8mm - 150mm)

Etch Uniformity

1.06±% within 3” wafer

Etch rate

Process Chamber

Al anodized Chamber

He backside cooling / Bias / Chiller (-20℃ ~ 50℃)

ICP source with plasma spiral coil


Korea Vacuum Tech  ICP-RIE Series

Inquiry

KOMACHINE CO., LTD.
CEO  Charlie ParkCorporate #  535-86-00664
(Post 17015) 1101ho ,16-4, Dongbaekjungang-ro 16beon-gil, Giheung-gu, Yongin-si, Gyeonggi-do, Republic of Korea

ⓒ2022 Komachine Co. All rights reserved.