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Product Name
Model Thermal CVD Series
Series CVD
Catalog
Product Description

Overview

Korea Vacuum Tech, Inc. (KVT) is proud to introduce the
latest revolutionary addition to our product line, the
CVD system.
Chemical Vapor Deposition is a chemical reactive
process used to produce high –purity, high performance
solid materials in a vacuum state. In a typical
CVD process, the water(substrate) is exposed to one or
more volatile precursors which react and / or decompose
on the substrate surface to produce a desired
deposit. Thermal Chemical Vapor Deposition(Thermal
CVD) is a unique form of the CVD process used primarily
to deposit thin lms from a gaseous state(Vapor) to
a solid state on some substrate. Thermal CVD is
dependent upon thermal energy to create of maintain
a chemical reaction.

 

Features

≻ 3 Zone Furnace for temperature up to 1000℃

≻ Sample size : up to 2”

≻ Easy to sample loading & unloading by loading bar

≻ 3” dia. Quartz Tube

≻ Operation pressure ~ 1Torr

≻ No water cooling  

Specifications

ITEM

SPECIFICATIONS

Dimension

1990(W) x 850(D) x 1200 (H)

Weight

250 kg

Loading bar

Sample retract & extend

Substrate

Size : Piece to 2 inch

Temperature

Heating: up to 1000℃ on substrate

Three zone controlled furnace

Vacuum

Pumping

Rotary pump

Vacuum

Gauge

Convection gauge

Gas Supply

Ar, H2, CH4, N2 MFC

Pressure

control

Auto throttle valve & CDG sensor

Korea Vacuum Tech  Thermal CVD Series

Products of Korea Vacuum Tech