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EUGENE TECH

EUGENE TECH

EUGENE TECH

EUGENE TECH

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EUGENE TECH

EUGENE TECH

Multi-Stack SEG(Selective Epitaxial Growth) System

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Description

The Falcon™ : Multi-Stack wafer architecture with independent gas distribution and wafer rotation offers a higher productivity alternative to today’s much lower throughput solutions, with minimal to no pattern size effects.

 

Key Features

- Multi-stack Wafer Process

- Independently Controlled Gas Distribution Nozzle for Each Wafer 

- Wafer Rotation

- In-situ Chamber Cleaning

- Dry Pre-clean Chamber


Benefits

- High Throughput

- Excellent Within Wafer Uniformity - Thickness & Dopant Concentration

- Excellent Wafer to Wafer Uniformity - Thickness & Dopant Concentration

- Minimal Loading Effect

- Lower Particle Generation with In-situ Cleaning 


Applications

EUGENE TECH Multi-Stack SEG(Selective Epitaxial Growth) System Falcon™

Inquiry

Komachine Inc.
Head Office:
Ace Dongbaek Tower 1-1101, 16-4,
Dongbaekjungang-ro 16beon-gil, Giheung-gu,
Yongin City, Gyeonggido, South Korea 17015
Branch Office:
606, Seoul Stratup Center, 10,
Noryangjin-ro, Dongjak-gu, Seoul, South Korea 06938
CEOCharlie Park
Corporate #535-86-00664

ⓒ2024 Komachine Inc. All rights reserved.