EUGENE TECH
Multi-Stack SEG(Selective Epitaxial Growth) System
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Description
The Falcon™ : Multi-Stack wafer architecture with independent gas distribution and wafer rotation offers a higher productivity alternative to today’s much lower throughput solutions, with minimal to no pattern size effects.
- Multi-stack Wafer Process
- Independently Controlled Gas Distribution Nozzle for Each Wafer
- Wafer Rotation
- In-situ Chamber Cleaning
- Dry Pre-clean Chamber
- High Throughput
- Excellent Within Wafer Uniformity - Thickness & Dopant Concentration
- Excellent Wafer to Wafer Uniformity - Thickness & Dopant Concentration
- Minimal Loading Effect
- Lower Particle Generation with In-situ Cleaning