Search

EUGENE TECH

EUGENE TECH

EUGENE TECH

EUGENE TECH

HomeManufacturersEUGENE TECH
1/1
EUGENE TECH

EUGENE TECH

Plasma Enhanced ALD System

Model

Series

Products


Transaction Process

Please contact the manufacturer/supplier.

Payment

Contact the manufacturer/supplier.

Delivery

Contact the manufacturer/supplier.

Shipment

Contact the manufacturer/supplier.

Origin

Contact the manufacturer/supplier.


Description

The Phoenix™: Unique chamber design, with laminar flow capability and excellent plasma uniformity enables deposition of high quality films for challenging applications. Plasma Enhanced ALD system provides the superior film quality using Eugene Technology’s patented Super Cycle Densification Technology.

 

Key Features

- Deposition Temperature Range: 50~550°C

- Patented Plasma Densification Process

- Compact Twin Chamber Configuration with Laminar Flow

- Square Type Chamber, CCP Design

- Wafer Rotation for Various Thickness Map ; Flat, Convex, Concave


Benefits

- High Throughput: Four (4), Twin Chamber Process Modules
- Excellent Step Coverage and Minimized Loading Effect
- Excellent Thickness Uniformity and Repeatability 
- Wet Etch Rate Control
- High Density Film Quality at Low Temperature
- Good Electrical Characteristics and Low Wet Etch Properties


Applications

EUGENE TECH Plasma Enhanced ALD System Phoenix ™

Inquiry

Komachine Inc.
Head Office:
Ace Dongbaek Tower 1-1101, 16-4,
Dongbaekjungang-ro 16beon-gil, Giheung-gu,
Yongin City, Gyeonggido, South Korea 17015
Branch Office:
606, Seoul Stratup Center, 10,
Noryangjin-ro, Dongjak-gu, Seoul, South Korea 06938
CEOCharlie Park
Corporate #535-86-00664

ⓒ2024 Komachine Inc. All rights reserved.