CN1
CN1
Description
Compact reactor Thermal ALD
ㆍCompact ALD Model
ㆍThermal ALD
ㆍWafer Size : ≤ 6″ Wafer
ㆍProcess temperature : up to 250°C
ㆍApplications : Oxide Film(Al2O3), etc
ㆍVery small Volume for process
Komachine Inc.
Head Office:
Ace Dongbaek Tower 1-1101, 16-4,
Dongbaekjungang-ro 16beon-gil, Giheung-gu,
Yongin City, Gyeonggido, South Korea 17015
Branch Office:
606, Seoul Stratup Center, 10,
Noryangjin-ro, Dongjak-gu, Seoul, South Korea 06938
CEOCharlie Park
Corporate #535-86-00664
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