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Atomic-Classic

Model

Series

ALD


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Description

Traveling wave type ALD

ㆍTraveling wave type thermal ALD

ㆍLaminar gas flow (Side gas flow)

ㆍVariable gas delivery system : Bubbler, LDS

ㆍLow particle generation

ㆍVery small volume for process

ㆍAvailable laminated & mixed process

ㆍProcess temperature : up to 450°C

ㆍPrecursor canister : 4EA(standard)

ㆍSubstrate size :
   4 ~ 8” wafer
   2G : 370x470mm glass

ㆍApplications
Dielectric thin films : Al2O3, HfO2, ZrO2, TiO2, ZnO2, STO, ZnS, Laminate films, etc.

CN1 Atomic-Classic

Inquiry

Komachine Inc.
Head Office:
Ace Dongbaek Tower 1-1101, 16-4,
Dongbaekjungang-ro 16beon-gil, Giheung-gu,
Yongin City, Gyeonggido, South Korea 17015
Branch Office:
606, Seoul Stratup Center, 10,
Noryangjin-ro, Dongjak-gu, Seoul, South Korea 06938
CEOCharlie Park
Corporate #535-86-00664

ⓒ2024 Komachine Inc. All rights reserved.